Izingcezu ze-Tungsten Silicide

I-Tungsten silicide WSi2 isetshenziswa njengento yokushaqeka kagesi kuma-microelectronics, ishunqeleka ezintanjeni ze-polysilicon, i-anti-oxidation coating kanye ne-resistance wire coating. I-Tungsten silicide isetshenziswa njengento yokuxhumana ku-microelectronics, ene-resistiveivity engu-60-80μΩcm. Yakheka ku-1000°C. Ngokuvamile isetshenziswa njenge-shunt yemigqa ye-polysilicon ukuze kwandiswe ukuqhutshwa kwayo nokwandisa isivinini sesignali. Isendlalelo se-tungsten Silicide singalungiswa ngokufakwa komhwamuko wamakhemikhali, njengokubeka umhwamuko. Sebenzisa i-monosilane noma i-dichlorosilane ne-tungsten hexafluoride njengegesi yezinto ezingavuthiwe. Ifilimu efakwe idiphozithi ayiyona i-stoichiometric futhi idinga ukufakwa kwe-anneal ukuze iguqulwe ibe yifomu le-stoichiometric eliqhuba kakhulu.

I-Tungsten silicide ingathatha indawo yefilimu ye-tungsten yangaphambili. I-Tungsten silicide nayo isetshenziswa njengesendlalelo sokuvimbela phakathi kwe-silicon nezinye izinsimbi.

I-Tungsten silicide nayo iyigugu kakhulu ezinhlelweni ze-microelectromechanical, phakathi kwazo i-tungsten silicide esetshenziswa kakhulu njengefilimu elincanyana lokukhiqiza ama-microcircuits. Ngale njongo, ifilimu ye-tungsten silicide ingaba yi-plasma-etched isebenzisa, isibonelo, i-silicide.

I-Rich Special Materials igxile ekwakhiweni kwe-Sputtering Target futhi ingakhiqiza i-Tungsten Silicide.izingcezungokuya ngemininingwane yeKhasimende. Ukuze uthole ukwaziswa okwengeziwe, sicela usithinte.