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I-AlNi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

I-Aluminium Nickel

Incazelo emfushane:

Isigaba

I-Alloy Sputtering Target

I-Chemical Formula

AlNi

Ukwakheka

I-Aluminium Nickel

Ubumsulwa

99.9%, 99.95%, 99.99%

Isimo

Amapuleti, Okuqondiwe Kwekholomu, ama-arc cathodes, enziwe ngokwezifiso

Inqubo Yokukhiqiza

Ukuncibilika kweVacuum, PM

Usayizi Otholakalayo

L≤200mm, W≤200mm


Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Ithagethi ye-Aluminium Nickel alloy sputtering ikhiqizwa ngendlela yokuncibilika kwe-vacuum kanye nokusansimbi kwamandla. Ukuhlanganisa i-Aluminium neNickel ngenani elidingekayo ukuze unikeze ingot yokusakaza ye-AlNi. Ingot yokulingisa ibe isisikwa ukuze kwakheke umumo wethagethi oyifunayo. Inokuqina okuphezulu, usayizi wokusanhlamvu ocolisisiwe kanye nesakhiwo se-homogeneous microstructure, ngaphandle kokufutha kwegesi noma ama-pores.

Ngenxa yokuhlanganiswa kwayo okuhle kwezinto zokumboza kanye ne-substrate, ukufakwa kwe-AlNi kusebenza kahle ngaphansi kuka-700 ℃. Manje i-AlNi sputtering target isetshenziswa kakhulu ekugqokeni okungagqoki, okuhlanganisa amathuluzi okusika, isikhunta, izimboni zezimoto nezokwakha.

I-Rich Special Materials ingumkhiqizi we-Sputtering Target futhi ingakhiqiza izisetshenziswa ze-Aluminium Nickel Sputtering ngokuya ngokucaciswa kweKhasimende. Ukuze uthole ulwazi olwengeziwe, sicela usithinte.


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