Njengoba sonke sazi, ukuhwamuka kwe-vacuum kanye ne-ion sputtering kuvame ukusetshenziswa ekufakweni kwe-vacuum. Uyini umehluko phakathi kwe-evaporation coating kanye ne-sputtering coating? Okulandelayo, ochwepheshe bezobuchwepheshe abavela ku-RSM bazokwabelana nathi.
I-vacuum evaporation coating iwukushisa into ezohwamuka iye ezingeni lokushisa elithile ngokushisisa ukumelana noma ugongolo lwe-electron kanye ne-laser bombardment endaweni ene-vacuum degree engekho ngaphansi kuka-10-2Pa, ukuze amandla okudlidliza ashisayo ama-molecule noma ama-athomu entweni adlula amandla abophayo angaphezulu, ukuze inani elikhulu lama-athomu noma ama-athomu ahwamuke noma anciphe, futhi awele ngokuqondile i-substrate ukwenza ifilimu. I-ion sputtering coating isebenzisa ukunyakaza kwesivinini esikhulu sama-ion aqondile akhiqizwe ukuchithwa kwegesi ngaphansi kwesenzo senkundla kagesi ukuze kuqhume ithagethi njenge-cathode, ukuze ama-athomu noma ama-molecule asendaweni eqondiwe abaleke futhi awele phezulu kwendawo yokusebenza epuletiwe ukuze akheke. ifilimu edingekayo.
Indlela evame ukusetshenziswa kakhulu ye-vacuum evaporation coating ukushisa ukumelana, okunezinzuzo zesakhiwo esilula, izindleko eziphansi nokusebenza okulula; Ububi ukuthi ayifanele izinsimbi eziphikisayo kanye nezinto ze-dielectric eziphikisana nokushisa okuphezulu. Ukushisa kwe-electron beam kanye nokushisa kwe-laser kunganqoba ukushiyeka kokushisa kokumelana. Ekushisiseni kwe-electron beam, i-electron beam egxilile isetshenziselwa ukushisa ngokuqondile into eqhunyiswa ngebhomu, futhi amandla e-kinetic we-electron beam aba amandla okushisa, okwenza izinto zihwamuke. Ukushisisa nge-laser kusebenzisa i-laser enamandla amakhulu njengomthombo wokushisisa, kodwa ngenxa yezindleko eziphezulu ze-laser enamandla amakhulu, kungasetshenziswa kuphela kumalabhorethri ambalwa ocwaningo okwamanje.
Ubuchwepheshe be-sputtering buhlukile kubuchwepheshe be-vacuum evaporation. “I-Sputtering” ibhekisela esenzakalweni lapho izinhlayiya ezishajiwe ziqhumisa indawo eqinile (okuqondiwe) futhi zenze ama-athomu aqinile noma ama-molecule adubula phezulu. Iningi lezinhlayiya ezikhishiwe zisesimweni se-athomu, esivame ukubizwa ngokuthi ama-athomu ahlakazekile. Izinhlayiya ezinama-sputtered ezisetshenziselwa ukubhomba okuqondiwe kungaba ama-electron, ama-ion noma izinhlayiya ezingathathi hlangothi. Ngenxa yokuthi ama-ion kulula ukusheshisa ngaphansi kwenkundla kagesi ukuze athole amandla e-kinetic adingekayo, iningi lawo lisebenzisa ama-ion njengezinhlayiya eziqhumayo. Inqubo ye-sputtering isekelwe ekuphumeni okukhanyayo, okungukuthi, ama-ion sputtering avela ekukhishweni kwegesi. Ubuchwepheshe obuhlukene bokukhipha amanzi busebenzisa izindlela ezihlukene zokukhipha ukukhanya. I-DC diode sputtering isebenzisa ukukhishwa kokukhanya kwe-DC; I-Triode sputtering wukuphuma okukhanyayo okusekelwa i-cathode eshisayo; I-RF sputtering isebenzisa ukukhishwa kokukhanya kwe-RF; I-Magnetron sputtering iwukukhipha okukhanyayo okulawulwa yi-annular magnetic field.
Uma kuqhathaniswa ne-vacuum evaporation coating, i-sputtering coating inezinzuzo eziningi. Isibonelo, noma iyiphi into ingafafazwa, ikakhulukazi izakhi nezinhlanganisela ezinephuzu eliphezulu lokuncibilika kanye nomfutho womoya ophansi; Ukunamathela phakathi kwefilimu ene-sputtered ne-substrate kuhle; Ukuminyana kwefilimu ephezulu; Ubukhulu befilimu bungalawulwa futhi ukuphindaphinda kuhle. Ububi ukuthi okokusebenza kuyinkimbinkimbi futhi kudinga amadivaysi anamandla kagesi.
Ngaphezu kwalokho, inhlanganisela yendlela yokuhwamuka kanye nendlela yokufafaza i-ion plating. Izinzuzo zale ndlela ukuthi ifilimu etholiwe inokunamathela okuqinile ne-substrate, izinga eliphezulu lokubeka kanye nokuphakama kwefilimu.
Isikhathi sokuthumela: Jul-20-2022