I-Wholesale CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Umkhiqizi Nomphakeli Owenziwe Ngokwezifiso

I-Chromium Aluminium

I-CrAl Alloy Sputtering Target High Purity High Thin Filamu ye-PVD Enamathela Ngokwezifiso Esenziwe Isithombe Esifakiwe

Incazelo emfushane:

Isigaba	I-Alloy Sputtering Target
I-Chemical Formula	CrAl
Ukwakheka	I-Chromium Aluminium
Ubumsulwa	99.7%, 99.9%, 99.95%, 99.99%
Isimo	Amapuleti, Okuqondiwe Kwekholomu, ama-arc cathodes, enziwe ngokwezifiso
Inqubo Yokukhiqiza	Ukuncibilika kweVacuum, PM
Usayizi Otholakalayo	L≤2000mm, W≤200mm

Thumela i-imeyili kithi

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Ukwenziwa kwe-Chromium Aluminium Sputtering Target kuhlanganisa lezi zinyathelo ezilandelayo:

1. Ukugaya impushana nokuxuba.

2. Ukwelashwa kokucindezela kwe-isostatic okushisayo ukuze uthole imikhiqizo eseqediwe kancane.

3. Ukukhanda into ehlosiwe ye-chromium aluminium alloy sputtering ukuze kutholwe into ehlosiwe ye-chromium aluminium alloy sputtering.

Phakathi nenqubo yokubeka okuhlosiwe kwe-CrAl sputtering, kwakheka i-Aluminium-Chrom-Nitrid (AlCrN) eqinile enamathelayo. Lokhu kunamathela kubonisa ubulukhuni obuphezulu kanye nezakhiwo zokumelana ne-oxidation ngisho nasezingeni eliphezulu lokushisa. Abasiki bangasebenza ngokuphakelayo okuphezulu ukuze bakhulise umkhiqizo futhi bakhuphule izinga lapho besebenzisa imishini ye-CNC.

Izinhloso zethu ezijwayelekile ze-AlCr nezakhiwo zazo

	I-Cr-70Alat%	I-Cr-60Alat%	I-Cr-50Alat%
Ubumsulwa (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Ukuminyana(g/cm³）	3.7	4.35	4.55
Gimvula Usayizi(µm)	100/50	100/50	100/50
Inqubo	I-HIP	I-HIP	I-HIP

I-Rich Special Materials igxile Ekwenziweni Kwethagethi Ye-Sputtering futhi ingakhiqiza okokusebenza kwe-Aluminium Chromium Sputtering ngokuya ngokucaciswa kweKhasimende. Imikhiqizo yethu ifaka izici ezinhle kakhulu zemishini, ukwakheka okulinganayo, indawo epholishiwe ngaphandle kokuhlukaniswa, izimbotshana noma imifantu. Ukuze uthole ulwazi olwengeziwe, sicela usithinte.

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