Siyakwamukela kumawebhusayithi ethu!

I-AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made

I-Aluminium-Tantalum

Incazelo emfushane:

Isigaba

I-Alloy Sputtering Target

I-Chemical Formula

I-AlTa

Ukwakheka

I-Aluminium-Tantalum

Ubumsulwa

99.9%, 99.95%, 99.99%

Isimo

Amapuleti, Okuqondiwe Kwekholomu, ama-arc cathodes, enziwe ngokwezifiso

Inqubo Yokukhiqiza

Ukuncibilika kweVacuum, PM

Usayizi Otholakalayo

L≤200mm, W≤200mm


Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Okuhlosiwe kulungiswa ngokuhlanganisa i-Aluminium ne-Tantalum powders noma ukuncibilika kwe-vacuum okulandelwa ukuminyana ukuze kube ukuminyana okugcwele. Izinto ezihlanganisiwe ngaleyo ndlela zikhethwa ngokuzikhethela bese zibunjwa zibe yisimo esidingekayo.

Ithagethi ye-Aluminium Tantalum sputtering inokuhlanzeka okuphezulu, i-homogeneous microstructure kanye nokusebenza okuhle kakhulu. Isetshenziswa kabanzi ekwakhiweni kwamafilimu amancanyana embonini yokubonisa iphaneli eyisicaba. I-Aluminium Tantalum ingase yengezwe ukuze kukhiqizwe ukusebenza okuphezulu kwe-Titanium alloy ukuze kuthuthukiswe ukufaneleka kwayo kwezinga lokushisa eliphezulu.

Okuqukethwe ukungcola kwe-Al-Ta alloy

ukwakheka

Okuqukethwe(%)

Ta

Fe

Si

C

O

I-AlTa60

55.0~65.0

≤0.05

≤0.02

≤0.01

≤0.05

I-AlTa70

65.0~75.0

≤0.05

≤0.02

≤0.01

≤0.05

I-Rich Special Materials igxile Ekwenziweni Kwethagethi Ye-Sputtering futhi ingakhiqiza Izinto Ezisetshenziswayo Zokuqhumisa ze-Aluminium Tantalum ngokuya ngokucaciswa kweKhasimende. Imikhiqizo yethu ifaka izici ezinhle kakhulu zemishini, ukwakheka okulinganayo, indawo epholishiwe ngaphandle kokuhlukaniswa, izimbotshana noma imifantu. Ukuze uthole ulwazi olwengeziwe, sicela usithinte.


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