Iingceba zeSilicide zeTungsten

I-Tungsten silicidi ye-WSi2 isetyenziswa njengesixhobo sokutshitshiswa kombane kwi-microelectronics, i-shunting kwiingcingo ze-polysilicon, i-anti-oxidation coating kunye ne-resistance wire coating. I-silicid ye-Tungsten isetyenziswe njengento yoqhagamshelwano kwi-microelectronics, kunye ne-resistiveivity ye-60-80μΩcm. Yenziwa kwi-1000°C. Ngokuqhelekileyo isetyenziselwa i-shunt yemigca ye-polysilicon ukunyusa i-conductivity yayo kunye nokunyusa isantya somqondiso. Umaleko we-Silicide we-tungsten unokulungiswa ngokubeka umphunga wekhemikhali, njengokubeka umphunga. Sebenzisa i-monosilane okanye i-dichlorosilane kunye ne-tungsten hexafluoride njengegesi ekrwada. Ifilimu egciniweyo i-non-stoichiometric kwaye idinga ukuba i-annealing iguqulwe ibe yifom ye-stoichiometric ehamba phambili.

I-Tungsten silicide ingathatha indawo yefilimu ye-tungsten yangaphambili. I-Tungsten silicide ikwasetyenziswa njengomaleko womqobo phakathi kwesilicon kunye nezinye isinyithi.

I-Tungsten silicide nayo ixabiseke kakhulu kwiinkqubo ze-microelectromechanical, phakathi kwayo i-tungsten silicide isetyenziswa kakhulu njengefilimu ebhityileyo yokwenza ii-microcircuits. Ngenxa yale njongo, ifilimu ye-silicid ye-tungsten ingaba yi-plasma-etched usebenzisa, umzekelo, i-silicide.

Izinto eziTyebileyo eziKhethekileyo zisebenza ngokukhethekileyo kuMveliso we-Sputtering Target kwaye inokuvelisa iTungsten Silicide.amaqhekezangokweenkcukacha zabaThengi. Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.