I-Magnetron sputtering coating yindlela entsha yokugquma umphunga, xa kuthelekiswa nendlela yokwaleka yangaphambili yokuba ngumphunga, izibonelelo zayo kwiinkalo ezininzi ziphawuleka kakhulu. Njengetekhnoloji evuthiweyo, i-magnetron sputtering isetyenziswe kwiinkalo ezininzi.
Umgaqo-siseko wokutshiza weMagnetron:
Intsimi yemagnethi ye-orthogonal kunye nentsimi yombane yongezwa phakathi kwepali ekujoliswe kuyo (i-cathode) kunye ne-anode, kunye negesi ye-inert efunekayo (ngokuqhelekileyo i-Ar gas) izaliswe kwigumbi eliphezulu le-vacuum. Umazibuthe osisigxina wenza i-250-350 gaus intsimi yamagnetic kumphezulu wento ekujoliswe kuyo, kwaye intsimi ye-orthogonal electromagnetic iqulunqwe kunye nentsimi yombane ephezulu. Ngaphantsi kwempembelelo yentsimi yombane, i-ionization yegesi ye-Ar ibe yi-ion kunye nee-electron, ekujoliswe kuyo kwaye inoxinzelelo oluthile olubi, ukusuka ekujoliswe kuyo kwipali ngempembelelo yentsimi yamagnetic kunye negesi esebenzayo ye-ionization yokwanda kwamathuba, yenza iplasma ephezulu yoxinaniso I-cathode, iArion phantsi kwentshukumo ye-lorentz force, khawulezisa ukubhabha ukuya kwindawo ekujoliswe kuyo, ukubhobhoza indawo ekujoliswe kuyo ngesantya esiphezulu, iiathom ezichithachithekileyo kwithagethi zilandela i umgaqo woguqulo olukhawulezileyo kwaye ubhabhe umke kwindawo ekujoliswe kuyo ngamandla amakhulu ekinetic ukuya kwifilimu ye-substrate yokubeka.
I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-DC sputtering kunye ne-RF sputtering. Umgaqo-nkqubo we-DC sputtering wezixhobo zilula, kwaye izinga likhawuleza xa kutshiza isinyithi. Ukusetyenziswa kwe-RF sputtering kubanzi ngakumbi, ukongeza kwizixhobo zokuqhuba, kodwa kunye nokutshiza izixhobo ezingaqhubekiyo, kodwa kunye nokulungiswa kokutshiza okusebenzayo kweeoksidi, ii-nitrides kunye ne-carbides kunye nezinye izinto ezihlanganisiweyo. Ukuba ubuninzi be-RF buyanda, iba yi-microwave plasma sputtering. Okwangoku, i-electron cyclotron resonance (ECR) uhlobo lwe-microwave plasma sputtering luqhele ukusetyenziswa.
Imathiriyeli ekujoliswe kuyo yokwaleka iMagnetron:
Intsimbi yokugalela imathiriyeli, izinto zokugquma ingxubevange yokwaleka, imathiriyeli yokwaleka yekeramic, ibhoride iithagethi zokugalela izinto ekujoliswe kuzo, imathiriyeli yethagethi yecaramic sputtering, imathiriyeli ye-fluoride ceramic sputtering, imathiriyeli ye-nitride ceramic sputtering, ithagethi ye-oxide ye-ceramic, i-selenide yethagethi yethagethi ye-sputtering. i-silicide ceramic sputtering imathiriyeli ekujoliswe kuyo, iseramikhi yesulfide i-sputtering target material, iTelluride ceramic sputtering target, enye ithagethi ye-ceramic, i-chromium-doped silicon oxide ceramic target (CR-SiO), i-indium phosphide target (InP), i-lead arsenide target (PbAs), i-indium arsenide target (InAs).
Ixesha lokuposa: Aug-03-2022