Ngoku abasebenzisi abaninzi nangakumbi baqonda iintlobo zeethagethi kunyeizicelo zayo,kodwa ukwahlulwa kwayo kunokungacaci kakuhle. Ngoku makheInjineli ye-RSM ukwabelana naweuqhelaniso oluthile yemagnetron sputtering targets.
Ithagethi yokutshiza: ithagethi yokugalela kwesinyithi, ithagethi yokugalela ingxubevange, ithagethi yokwaleka i-ceramic, ithagethi yokutshiza yeceramic, ithagethi yokutshiza yeceramic. ekujoliswe, sulfide ceramic Ithagethi ye-sputtering, i-teluride ceramic sputtering target, ezinye iithagethi ze-ceramic, i-Chromium doped silicon oxide ceramic target (CR SiO), i-indium phosphide target (INP), i-lead arsenide target (pbas), i-indium arsenide target (InAs).
I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-DC sputtering kunye ne-RF sputtering. Umgaqo-nkqubo we-DC sputtering wezixhobo zilula, kwaye izinga layo likwakhawuleza xa kutshiza isinyithi. I-RF sputtering isetyenziswa ngokubanzi. Ukongeza kwi-sputtering data conductive, inokuphinda ikhuphe idatha engasebenziyo. Ithagethi ye-sputtering ingasetyenziselwa ukutshiza okusebenzayo ukulungiselela idatha ehlanganisiweyo efana neeoksidi, ii-nitrides kunye ne-carbides. Ukuba iRF frequency iyanda, iya kuba yi microwave plasma sputtering. Okwangoku, i-electron cyclotron resonance (ECR) i-microwave plasma sputtering iqhele ukusetyenziswa.
Ixesha lokuposa: May-26-2022