Ngokunyuka kwemfuno yemarike, iintlobo ezininzi ngakumbi nangakumbi zokujoliswa kwe-sputtering zihlaziywa rhoqo. Ezinye ziqhelekile kwaye ezinye aziqhelanga kubathengi. Ngoku, singathanda ukwabelana nawe ukuba zeziphi iintlobo zeethagethi ze-magnetron sputtering.
Ithagethi yokutshiza inezi ntlobo zilandelayo: ithagethi yentsimbi yokugalela, ithagethi yokwaleka ialloyi, ithagethi yokutshiza yekeramic, ithagethi yokutshiza ye-boride ceramic, ithagethi yokutshiza ye-carbide ceramic, ithagethi yokutshiza ye-fluoride ceramic, ithagethi ye-nitride ceramic sputtering, ithagethi ye-oxide ye-ceramic, ithagethi ye-selenide ye-ceramic. , i-silicid ceramic sputtering target, i-sulfide ceramic Ithagethi ye-sputtering, i-teluride ceramic sputtering target, ezinye iithagethi ze-ceramic, i-Chromium doped silicon oxide ceramic target (CR SiO), i-indium phosphide target (INP), i-lead arsenide target (pbas), i-indium arsenide target (InAs).
I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-DC sputtering kunye ne-RF sputtering. Umgaqo-nkqubo we-DC sputtering wezixhobo zilula, kwaye izinga layo likwakhawuleza xa kutshiza isinyithi. I-RF sputtering isetyenziswa ngokubanzi. Ukongeza kwi-sputtering data conductive, inokuphinda ikhuphe idatha engasebenziyo. Kwangaxeshanye, ithagethi yokutshiza iphinda ikhuphe i-reactive sputtering ukulungiselela i-compound data efana ne-oxides, i-nitrides kunye ne-carbides. Ukuba iRF frequency iyanda, iya kuba yi microwave plasma sputtering. Okwangoku, i-electron cyclotron resonance (ECR) i-microwave plasma sputtering iqhele ukusetyenziswa.
Ixesha lokuposa: May-18-2022