Ithagethi ineziphumo ezininzi, kwaye indawo yophuhliso lweemarike inkulu. Iluncedo kakhulu kwiinkalo ezininzi. Phantse zonke izixhobo ezitsha zokutshiza zisebenzisa iimagnethi ezinamandla kwi-elektroni ezijikelezayo ukukhawulezisa i-ionization ye-argon kwindawo ekujoliswe kuyo, okukhokelela ekwandeni kwamathuba ongquzulwano phakathi kokujoliswe kuko kunye ne-argon ion. Ngoku makhe sijonge indima yethagethi ye-sputtering kwi-vacuum coating.
Phucula izinga lokutshiza. Ngokubanzi, i-DC sputtering isetyenziselwa ukutyabeka ngesinyithi, ngelixa i-RF AC sputtering isetyenziselwa izixhobo zemagneti ezingasebenziyo. Umgaqo osisiseko kukusebenzisa ukukhutshwa okukhanyayo ukubetha i-argon (AR) ion kumphezulu wethagethi kwi-vacuum, kwaye ii-cations kwiplasma ziya kukhawulezisa ukungxama ukuya kumphezulu we-electrode engalunganga njengento etshiziweyo. Le mpembelelo iya kwenza ukuba izinto ekujoliswe kuzo ziphume kwaye zifake kwi-substrate ukwenza ifilimu.
Ngokuqhelekileyo, kukho iimpawu ezininzi zokugquma ifilimu ngenkqubo ye-sputtering: (1) isinyithi, i-alloy okanye i-insulator ingenziwa kwidatha yefilimu.
(2) Ngaphantsi kweemeko ezifanelekileyo zokumisela, ifilimu enokwakheka okufanayo inokwenziwa kwiithagethi ezininzi kunye neziphazamisekileyo.
(3) Umxube okanye umxube wezinto ezijoliswe kuzo kunye neemolekyuli zegesi zinokuveliswa ngokudibanisa ioksijini okanye ezinye iigesi ezisebenzayo kumoya wokukhupha.
(4) Igalelo ekujoliswe kulo ngoku kunye nexesha lokutshiza liyakwazi ukulawulwa, kwaye kulula ukufumana ubukhulu befilimu obuchanekileyo.
(5) Xa kuthelekiswa nezinye iinkqubo, kuyanceda ekuvelisweni kweefilim zeendawo ezinkulu ezifanayo.
(6) Amasuntswana asasaziweyo aphantse angachatshazelwa ngumxhuzulane, kwaye iindawo ekujoliswe kuzo kunye nesubstrate zinokucwangciswa ngokukhululekileyo.
Ixesha lokuposa: May-17-2022