I-CrSi Alloy Sputtering Ithagethi ePhakamileyo ecocekileyo eNcinciweyo yeFilimu yePvd yoKutyabeka ngokweSiko

Ukwenziwa kweChronium Silicon Sputtering Target kubandakanya la manyathelo alandelayo:
1.Ukunyibilika kweSilicon kunye neChronium ngevacuum ukufumana ialloys zamanyathelo.
2.Ukugaya umgubo, ukupakishwa kunye nokukhutshwa.
I-3.Hot isostatic icinezela unyango lokufumana iimveliso ezigqityiweyo.
4.Machining the rough chromium-silicon alloy sputtering target material ukufumana i-chromium-silicon alloy sputtering target material.

I-CrSi ihlala isetyenziswa njengesixhobo sefilimu esixhathisayo, ibonakalisa ukuxhathisa okuphezulu, ukuzinza kunye nobushushu obuphantsi bokuchasana. I-Chronium kunye neSilicon inokuvelisa izigaba ezininzi ze-silicide ezifana ne-Cr3Si, i-Cr5Si3, i-CrSi, i-CrSi2. Inkqubo yokuvelisa, ukubunjwa kunye nenkqubo yonyango yokushisa yefilimu ye-CrSi ichaphazela kakhulu ukusebenza kwayo.

Izinto eziTyebileyo eziZodwa zisebenza ngokukhethekileyo kuMveliso weThagethi yeSputtering kwaye inokuvelisa iChronium Silicon Sputtering Materials ngokwemigaqo yabaThengi. Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.