Wamkelekile kwiiwebhusayithi zethu!

I-CoFeV Alloy Sputtering Ithagethi ePhakamileyo ecocekileyo eNcinciweyo yeFilimu yePvd yoKutyabeka ngokweSiko

Cobalt Iron Vanadium

Inkcazelo emfutshane:

Udidi

I-alloy Sputtering Target

Ifomula yeMichiza

FeCoV

Ukuqamba

Cobalt Iron Vanadium

Ubunyulu

99.9%, 99.95%, 99.99%

Ubume

Iipleyiti, iiKholamu ekuJoliswe kuzo, ii-arc cathodes, ezenzelwe wena

Inkqubo yeMveliso

Ukunyibilika kweVacuum

Ubungakanani obukhoyo

L≤2000mm,W≤200mm


Iinkcukacha zeMveliso

Iithegi zeMveliso

Cobalt Iron Vanadium sputtering target has 52% umxholo Cobalt, 9% -23% umxholo Vanadium kunye nabanye - ductile esisigxina-magnetic izinto. Ibonisa umthamo ogqwesileyo weplastiki kwaye inokwenziwa ibe ngamacandelo aneefom ezintsonkothileyo.

I-Cobalt Iron Vanadium ialloy sputtering ithagethi inoxinaniso oluphezulu kakhulu lokuxinana kwe-Bs(2.4T) kunye nobushushu beCurie(980~1100℃). Inokunceda ekunciphiseni ubunzima kwaye inokuphucula ukuzinza kumaqondo okushisa aphakamileyo. Yimathiriyeli efanelekileyo kwizixhobo zombane zokubhabha (oomatshini abancinci abakhethekileyo bombane, umazibuthe wombane kunye nesilayidi sombane). Ikwanayo ne-saturation ye-magnetostriction coefficient ephezulu, kwaye inokuvelisa i-magnetostrictive transducer.

Materials ezityebileyo ezikhethekileyo iManufacture of Sputtering Target kwaye inokuvelisa iCobalt Iron Vanadium Sputtering Materials ngokwemigaqo yabaThengi. Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.


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