Ihoseyili iAlTa Sputtering Ithagethi ePhezulu Ucoceko oluPhezulu oluNcinci oluNcinci lweFilimu ye-PVD yoKutyabeka uMvelisi kunye noMboneleli-mpahla

Aluminiyam-Tantalum

I-AlTa Sputtering Ithagethi ePhezulu Ukucoceka okuPhakamileyo kweFilimu ye-PVD yoMtyalo owenziwe ngokweSiko oFakelweyo

Inkcazelo emfutshane:

Udidi	I-alloy Sputtering Target
Ifomula yeMichiza	AlTa
Ukuqamba	Aluminiyam-Tantalum
Ubunyulu	99.9%, 99.95%, 99.99%
Ubume	Iipleyiti, iiKholamu ekuJoliswe kuzo, ii-arc cathodes, ezenzelwe wena
Inkqubo yeMveliso	Ukunyibilika kweVacuum, PM
Ubungakanani obukhoyo	L≤200mm,W≤200mm

Thumela i-imeyile kuthi

Iinkcukacha zeMveliso

Iithegi zeMveliso

Iithagethi zilungiswa ngokuxuba i-Aluminiyam kunye ne-Tantalum powders okanye i-vacuum melting elandelwa kukuxinaniswa koxinano olupheleleyo. Iimathiriyeli ezidityanisiweyo zikhethwa ngokuzithandela kwaye zenziwe ngendlela efunwayo.

Ithagethi ye-Aluminium Tantalum sputtering inobunyulu obuphezulu, i-microstructure ene-homogeneous kunye ne-conductivity egqwesileyo. Isetyenziswa kakhulu ekuyilweni kweefilimu ezibhityileyo kushishino lokubonisa iipaneli ezisicaba. I-Aluminium Tantalum nayo inokongezwa ukuvelisa ukusebenza okuphezulu kwe-Titanium alloy ukuphucula ukufaneleka kwayo kobushushu obuphezulu.

Umxholo ongcolileyo we-Al-Ta alloy

ukwakheka	Umxholo(%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Izinto eziTyebileyo eziZodwa zisebenza ngokukhethekileyo kuMveliso weThagethi yeSputtering kwaye inokuvelisa iAluminium Tantalum Sputtering Materials ngokwemigaqo yabaThengi. Iimveliso zethu zineempawu ezigqwesileyo zoomatshini, ubume obufanayo, umphezulu ogudisiweyo ngaphandle kokwahlulwa, iipores okanye iintanda. Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.

Ngaphambili: Ingxubevange yeAlTi iSputtering Target High Purity

Okulandelayo: I-AlCu Sputtering Ithagethi ePhezulu Ukusulungeka kweFilimu yePVD eNcinciweyo eyenziwe ngokweSiko