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I-AlCu Sputtering Ithagethi ePhezulu Ukusulungeka kweFilimu yePVD eNcinciweyo eyenziwe ngokweSiko

Ubhedu lweAluminiyam

Inkcazelo emfutshane:

Udidi

I-alloy Sputtering Target

Ifomula yeMichiza

AlCu

Ukuqamba

Ubhedu lweAluminiyam

Ubunyulu

99.9%, 99.95%, 99.99%

Ubume

Iipleyiti, iiKholamu ekuJoliswe kuzo, ii-arc cathodes, ezenzelwe wena

Inkqubo yeMveliso

Ukunyibilika kweVacuum, PM

Ubungakanani obukhoyo

L≤200mm,W≤200mm


Iinkcukacha zeMveliso

Iithegi zeMveliso

I-aluminium Copper sputtering target igqibelele kwinani lamashishini kunye nezicelo, ngenxa yobunzima bayo obuphezulu, amandla okuqina kunye nobunzima obulula. Idla ngokuba ne-1-3% yobhedu kwaye ineempawu zeekhemikhali ezifanayo kunye ne-Aluminium. I-AlCu ineempawu eziphezulu zoomatshini, ubuchule obugqwesileyo, kunye nokufaneleka kobushushu obuphezulu, ngoko inokuba yinto efanelekileyo yokusebenza okuphezulu kwe-aluminium alloy. Ucoceko oluphezulu lwethagethi ye-alcu yealloy sputtering ingasetyenziswa kuluhlu olubanzi lweenkalo zoshishino ukusuka kwisemiconductor kunye namacandelo asebenzayo e-elektroniki.

Izinto eziTyebileyo eziZodwa zisebenza ngokukhethekileyo kuMveliso weThagethi yeSputtering kwaye inokuvelisa iAluminium Chromium Sputtering Materials ngokwemigaqo yabaThengi. Iimveliso zethu zineempawu ezibalaseleyo zoomatshini, ubume obufanayo, umphezulu ogudisiweyo ngaphandle kokwahlulwa, iipores, okanye iintanda. Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.


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