Wholesale Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Our well-equipped facilities and excellent excellent management throughout all stages of creation enables us to guarantee total buyer satisfaction for Zinc Zn Sputtering Target , Zirconium Sputtering Target , Vanadium Sputtering Target , Our merchandise delight in excellent popularity among our buyers. We welcome consumers, business enterprise associations and good friends from all components with the globe to make contact with us and seek out cooperation for mutual rewards.

Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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continue to enhance, to be certain solution top quality in line with market and buyer standard requirements. Our corporation has a excellent assurance program are actually established for Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Kuwait, Croatia, Australia, Immediate and expert after-sale service supplied by our consultant group has happy our buyers. Comprehensive Info and parameters from the merchandise will probably be sent to you for any comprehensive acknowledge. Free samples may be delivered and company check out to our corporation. n Morocco for negotiation is constantly welcome. Hope to get inquiries type you and construct a long-term co-operation partnership.

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The customer service reprersentative explained very detailed, service attitude is very good, reply is very timely and comprehensive, a happy communication! We hope to have a opportunity to cooperate.