Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.
After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Adhering for the theory of "quality, services, performance and growth", we have received trusts and praises from domestic and worldwide shopper for Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Hamburg, Lyon, Serbia, We follow up the career and aspiration of our elder generation, and we are eager to open up a new prospect in this field, We insist on "Integrity, Profession, Win-win Cooperation", because we have a strong backup, that are excellent partners with advanced manufacturing lines, abundant technical strength, standard inspection system and good production capacity.
By Jenny from Poland - 2018.11.11 19:52
Product quality is good, quality assurance system is complete, every link can inquire and solve the problem timely!
By Katherine from Israel - 2017.05.31 13:26
