Ano ang mga magnetron sputtering target na materyales

Metal sputtering target na materyal, coating alloy sputtering coating material, ceramic sputtering coating material, boride ceramic sputtering target na materyales, carbide ceramic sputtering target na materyal, fluoride ceramic sputtering target na materyal, Nitride ceramic sputtering target na materyales, oxide ceramic target, Selenide ceramic na target na materyal, sputtering na materyal Silicide ceramic sputtering target na materyales, sulfide ceramic sputtering target na materyal, Telluride ceramic sputtering target, iba pang ceramic target, chromium-doped silicon oxide ceramic target (CR-SiO), indium Phosphide target (InP), lead Arsenide target (PbAs), Indium Arsenide target (InAs).

Ang high purity at high density sputtering target na materyales ay:

Sputtering target na materyal (purity: 99.9%-99.999%)

1. Target na metal:

Nickel target, Ni, Titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, Niobium target, Nb, Tin target, Sn, aluminum target, Al, Indium target, In, Iron target, Fe, Zirconium aluminum target, ZrAl, Titanium aluminum target, TiAl, Zirconium target, Zr, aluminum-silicon target, AlSi, silicon target, Si, tansong target Cu, tantalum target T, A, Germanium target, Ge, silver target, Ag, cobalt target, Co, gold target, Au, gadolinium target, Gd, lanthanum target, La, yttrium target, Y, cerium target, Ce, tungsten target, W, stainless steel target , nickel-chromium target, NiCr, hafnium target, Hf, molibdenum target, Mo, Fe-Ni target, FeNi, tungsten target, W, atbp.

2. Ceramic target na materyal

Target ng ITO, ferric oxide, magnesium oxide target, target, target, silicon carbide silicon nitride titanium nitride target target target, target, zinc sulfide, zinc oxide, chromium oxide, silicon dioxide, target, target ang isang silicon oxide, cerium oxide target, target, limang zirconium dioxide oxygen HuaEr niobium target target, target, titanium dioxide, zirconium dioxide, hafnium target, target, titanium diboride diboride zirconium target, tungsten trioxide target, Aluminum trioxide target tantalum pentaoxide, niobium pentaoxide target, magnesium fluoride target, yttrium fluoride target, zinc selenide target, aluminum nitride target, silicon nitride target, boron nitride target, titanium nitride target, target ng silicon carbide, target ng lithium niobate, target na praseodymium titanate, barium titanate target, lanthanum titanate target, nickel oxide target, sputtering target, atbp.