TaNb Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Tantalum Niobium sputtering target is fabricated by means of vacuum melting of Tantalum and Niobium. These two are high melting point( Tantalum 2996℃, Niobium 2468℃), high boiling point(Tantalum 5427℃, Niobium 5127℃) rare metals. Tantalum Niobium alloy has the similar appearance with steel, it has a silver-gray lustre(while the powder is dark grey) . It has many favorable properties: corrosion resistance, superconductivity, and high temperature strength. So any applications or industries could benefit from using Tantalum Niobium alloys, such as electronics, glass & optics, aerospace,  medical device, superconductivity and steel.

Tantalum and Niobium have been crucial in the space industry for years due to their impressive strength, corrosion resistance and other attractive features, and have been used in many important components like rocket engines and nozzles.