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Super 4N5 99.995% High Purity Titanium Planar Sputtering Target for Vacuum/PVD Coating

Titanium

Short Description:

Category

Metal Sputtering Target

Chemical Formula

Ti

Composition

Titanium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Bear “Customer initially, High quality first” in mind, we do the job closely with our customers and supply them with efficient and skilled providers for Super 4N5 99.995% High Purity Titanium Planar Sputtering Target for Vacuum/PVD Coating, We invites you and your enterprise to thrive together with us and share a bright future in global market.
Bear “Customer initially, High quality first” in mind, we do the job closely with our customers and supply them with efficient and skilled providers for China ti target and ti sputtering, Now we are sincerely consider to grant brand agent in different areas and our agents’ maximum margin of profit is the most important thing we care about. Welcome all of the friends and customers to join us. We are ready to share win-win corporation.

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Titanium Sputtering Target Description

Titanium is a chemical element with the symbol Ti and atomic number 22. It is a lustrous transition metal with a silver color. Its melting point is (1660±10)℃, boiling point is 3287℃. It has light weight, high hardness, corrosion resistance to all types of chlorine chemicals.

Titanium resists corrosion by seawater, and it can dissolve in both acidic and in alkaline media.

Titanium alloy is extensively used in aerospace, chemical engineering, petroleum, medicine, construction, and other fields for its outstanding properties, like low density, thermal conductivity and excellent corrosion resistance, weldability and biocompatibility.

Titanium could absorb hydrogen, CH4 and Co2 gases, and it is widely used in high vacuum and ultra-high vacuum systems. Titanium sputtering target could be used for the fabrication of LSI, VLSI and ULSI circuit network, or barrier metal materials.

Titanium Sputtering Target Packaging

Our Titanium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Titanium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Bear “Customer initially, High quality first” in mind, we do the job closely with our customers and supply them with efficient and skilled providers for Super 4N5 99.995% High Purity Titanium Planar Sputtering Target for Vacuum/PVD Coating, We invites you and your enterprise to thrive together with us and share a bright future in global market.
Super China ti target and ti sputtering, Now we are sincerely consider to grant brand agent in different areas and our agents’ maximum margin of profit is the most important thing we care about. Welcome all of the friends and customers to join us. We are ready to share win-win corporation.


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