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NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Tantalum

Tlhaloso e Khutšoanyane:

Sehlopha

Sepheo sa Alloy Sputtering

Foromo ea Lik'hemik'hale

KeTa

Sebopeho

Nickel tantalum

Bohloeki

99.9%, 99.95%, 99.99%

Sebopeho

Lipoleiti, Lipehelo tsa Kholomo, li-arc cathodes, tse entsoeng ka mokhoa o ikhethileng

Mokhoa oa Tlhahiso

Ho qhibiliha ha Vacuum, PM

Boholo bo fumanehang

L≤200mm, W≤200mm


Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Nickel Tantalum Sputtering Targets e etsoa ka ho qhibiliha ha vacuum kapa mokhoa oa phofo oa metallurgical. E na le bohloeki bo phahameng le homogeneous microstructure.

Nickel Tantalum Sputtering Targets e sebelisoa haholo indastering ea lifofane, lifofane, indasteri ea ho tsamaea. Ho hanyetsa ha eona hantle ho mocheso o phahameng oa mocheso ho tsoa ho palo e kholo ea Tantalum e teng ka har'a motsoako, e nang le mocheso o phahameng oa ho qhibiliha oa 3000 ° C. Aluminium, Yttrium le Chronium hangata lia eketsoa molemong oa ho ntlafatsa thepa.

Rich Special Materials e sebetsa ka ho khetheha ho Manufacture of Sputtering Target mme e ka hlahisa Lisebelisoa tsa Nickel Tantalum Sputtering ho latela litlhaloso tsa Bareki. Ho fumana lintlha tse ling, ka kopo ikopanye le rona.


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