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NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Chromium Aluminium Silicon

Tlhaloso e Khutšoanyane:

Sehlopha

Sepheo sa Alloy Sputtering

Foromo ea Lik'hemik'hale

NiCrAlSi

Sebopeho

Nickel Chromium Aluminium Silicon

Bohloeki

99.5%, 99.9%, 99.95%

Sebopeho

Lipoleiti, Lipehelo tsa Kholomo, li-arc cathodes, tse entsoeng ka mokhoa o ikhethileng

Mokhoa oa Tlhahiso

Ho qhibiliha ha Vacuum

Boholo bo fumanehang

L≤1500mm, W≤200mm


Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Sepheo sa NiCrAlSi Sputtering se hlahisoa ke Vacuum Melting, Casting le Hot Treatment ho netefatsa botsitso bo phahameng, boholo bo botle ba lijo-thollo le tshebetso e ntle.

Ka lebaka la boits'oaro ba eona bo botle bo holimo, boits'oaro bo botle ba anti-corrosion, ho hanyetsa mocheso o phahameng le ho solderability, Nickel Chromium Aluminium Silicon alloy e sebelisoa haholo lits'ebetsong tse ngata tsa indasteri, ho kenyeletsoa Metallurgy, Mechini ea tlhahiso le Lisebelisoa tsa Ntlo.

Rich Special Materials e sebetsana ka ho khetheha le Tlhahiso ea Sputtering Target 'me e ka hlahisa Nickel Chromium Aluminium Silicon Sputtering Materials ho latela litlhaloso tsa Bareki. Ho fumana lintlha tse ling, ka kopo ikopanye le rona.


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