Hona joale basebelisi ba bangata ba utloisisa mefuta ea liphofu lelikopo tsa eona, empa karohano ea eona e kanna ea se hlake haholo. Joale ha reMoenjiniere oa RSM arolelana le uenaho kenya letsoho ea magnetron sputtering targets.
Sputtering target: metal sputtering coating target, alloy sputtering coating target, ceramic sputtering coating target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenide ceramic sputtering targeting sepheo, sulfide ceramic sputtering target, telluride ceramic sputtering target, targets other ceramic targets, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).
Magnetron sputtering ka kakaretso e arotsoe ka mefuta e 'meli: DC sputtering le RF sputtering. Molao-motheo oa lisebelisoa tsa sputtering tsa DC o bonolo, 'me sekhahla sa oona se boetse se potlakile ha u fafatsa tšepe. RF sputtering e sebelisoa haholo. Ntle le ho senya data ea conductive, e ka boela ea senya data e sa sebetseng. Sepheo sa sputtering se ka boela sa sebelisoa bakeng sa sputtering e sebetsang ho lokisa lintlha tse kopantsoeng tse kang oxides, nitrides le carbides. Haeba maqhubu a RF a eketseha, e tla fetoha microwave sputtering. Hajoale, hangata ho sebelisoa electron cyclotron resonance (ECR) microwave sputtering.
Nako ea poso: May-26-2022