Ka keketseho ea tlhokahalo ea 'maraka, mefuta e mengata ea lipehelo tsa sputtering e lula e ntlafatsoa. Tse ling li tloaelehile 'me tse ling ha lia tloaeleha ho bareki. Hona joale, re rata ho arolelana le uena hore na ke mefuta efe ea sepheo sa magnetron sputtering.
Sepheo sa sputtering se na le mefuta e latelang: target sputtering coating target, alloy sputtering coating target, target ea ceramic sputtering coating, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenide ceramic sputtering target. , silicide ceramic sputtering target, sulfide ceramic sputtering target, telluride ceramic sputtering target, targets other ceramic targets, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).
Magnetron sputtering ka kakaretso e arotsoe ka mefuta e 'meli: DC sputtering le RF sputtering. Molao-motheo oa lisebelisoa tsa sputtering tsa DC o bonolo, 'me sekhahla sa oona se boetse se potlakile ha u fafatsa tšepe. RF sputtering e sebelisoa haholo. Ntle le ho senya data ea conductive, e ka boela ea senya data e sa sebetseng. Ka nako e ts'oanang, sepheo sa sputtering se boetse se etsa sputtering e sebetsang ho lokisa lintlha tse kopantsoeng tse kang oxides, nitrides le carbides. Haeba maqhubu a RF a eketseha, e tla fetoha microwave sputtering. Hajoale, hangata ho sebelisoa electron cyclotron resonance (ECR) microwave sputtering.
Nako ea poso: May-18-2022