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The Magnetron Sputtering Melao-motheo bakeng sa Sputtering Lipheo

E tlameha ebe basebelisi ba bangata ba utloile ka sehlahisoa sa sputtering target, empa molao-motheo oa sputtering target e lokela ho ba o sa tloaelehang. Joale, mohlophisi oaRich Special Material(RSM) e arolelana melao-motheo ea magnetron sputtering ea sepheo sa sputtering.

 https://www.rsmtarget.com/

Sebaka sa "orthogonal magnetic field" le matla a motlakase li eketsoa pakeng tsa "electrode" e hlaselitsoeng (cathode) le anode, khase e hlokahalang ea inert (ka kakaretso Ar gas) e tlatsitsoe ka phapusing e phahameng ea vacuum, makenete e sa feleng e theha matla a khoheli a 250 ~ 350 Gauss. bokaholimo ba data e shebiloeng, 'me tšimo ea orthogonal electromagnetic e thehoa ka matla a matla a motlakase a phahameng.

Tlas'a phello ea sebaka sa motlakase, khase ea Ar e kenngoa ho li-ion le lielektrone tse ntle. Matla a itseng a mabe a phahameng a eketsoa ho sepheo. Phello ea matla a khoheli ho li-elektronike tse tsoang palo e lebisitsoeng le monyetla oa ionization oa ho eketseha ha khase e sebetsang, ho etsa plasma e phahameng haholo haufi le cathode. Tlas'a phello ea matla a Lorentz, Ar ions e potlakisa sebakeng seo ho shebiloeng ho sona ebe e otla sebaka seo ho shebiloeng ho sona ka lebelo le phahameng haholo, Liathomo tse hahelletsoeng ho sepheo li latela molao-motheo oa phetoho ea lebelo ebe li fofa hole le moo ho shebiloeng ho ea substrate e nang le matla a phahameng a kinetic. ho kenya lifilimi.

Magnetron sputtering ka kakaretso e arotsoe ka mefuta e 'meli: Tributary sputtering le RF sputtering. Molao-motheo oa lisebelisoa tsa tributary sputtering o bonolo, 'me lebelo la oona le lona le potlakile ha u fafatsa tšepe. RF sputtering e sebelisoa haholo. Ntle le lisebelisoa tsa conductive tse sputtering, e ka boela ea fafatsa lisebelisoa tse se nang conductive. Ka nako e ts'oanang, e boetse e etsa sputtering e sebetsang ho lokisa lisebelisoa tsa oxides, nitrides, carbides le metsoako e meng. Haeba maqhubu a RF a eketseha, e tla fetoha microwave sputtering. Hona joale, electron cyclotron resonance (ECR) microwave sputtering ea plasma e sebelisoa hangata.


Nako ea poso: May-31-2022