Mabapi le ts'ebeliso le molao-motheo oa theknoloji ea sputtering target, bareki ba bang ba buisane le RSM, hona joale bakeng sa bothata bona bo amehang haholoanyane, litsebi tsa theknoloji li arolelana tsebo e itseng e amanang le eona.
Sputtering target application:
Likaroloana tse tjhajang (tse kang li-ion tsa argon) li hlasela bokaholimo bo tiileng, bo bakang likaroloana tse kaholimo, joalo ka liathomo, limolek'hule kapa dingata ho tsoa holim'a ntho e bitsoang "sputtering". Ka magnetron sputtering coating, li-ion tse ntle tse hlahisoang ke argon ionization hangata li sebelisoa ho bomola ntho e tiileng (sepheo), 'me liathomo tse se nang lehlakore li kenngoa holim'a substrate (workpiece) ho etsa lera la filimi. Seaparo sa Magnetron sputtering se na le litšobotsi tse peli: "mocheso o tlase" le "ka potlako".
Molao-motheo oa Magnetron sputtering:
Orthogonal magnetic field le motlakase li eketsoa pakeng tsa sputtered target pole (cathode) le anode, 'me khase e hlokahalang ea inert (hangata Ar gas) e tlatsoa ka kamoreng e phahameng ea vacuum. Makenete oa ka ho sa feleng o etsa sebaka sa khoheli sa 250-350 Gauss holim'a thepa e shebiloeng, 'me e theha sebaka sa orthogonal electromagnetic ka matla a phahameng a motlakase.
Tlas'a ts'ebetso ea sebaka sa motlakase, Ar gas e kenngoa ho li-ion tse ntle le lielektrone, 'me ho na le khatello e itseng e mpe e phahameng holim'a sepheo, kahoo li-electrone tse tsoang polong ea sepheo li angoa ke matla a khoheli le monyetla oa ionization oa ho sebetsa. khase ea eketseha. Plasma e matla haholo e thehoa haufi le cathode, 'me li-ion tsa Arion li potlakisa ho ea sebakeng se lebisitsoeng tlas'a ketso ea matla a Lorentz 'me li phunyeletse sebaka seo ho sona ho shebiloeng ka lebelo le phahameng, e le hore liathomo tse hlaselitsoeng sebakeng se lebisitsoeng li balehe sebakeng se lebisitsoeng. matla a kinetic mme o fofele substrate ho theha filimi ho latela molao-motheo oa phetoho ea matla.
Magnetron sputtering hangata e arotsoe ka mefuta e 'meli: DC sputtering le RF sputtering. Molao-motheo oa lisebelisoa tsa sputtering tsa DC o bonolo, 'me sekhahla se potlakile ha u fafatsa tšepe. Ts'ebeliso ea RF sputtering e pharalletse ho feta, ntle le lisebelisoa tse tsamaisang metsi, empa hape e fafatsa lisebelisoa tse sa sebetseng, empa hape le ho lokisoa ha li-oxide, nitrides le li-carbide le lisebelisoa tse ling. Haeba maqhubu a RF a eketseha, e fetoha microwave sputtering. Hajoale, hangata ho sebelisoa mofuta oa electron cyclotron resonance (ECR) mofuta oa microwave sputtering.
Nako ea poso: Aug-01-2022