CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made
Chromium Aluminium
Ho etsoa ha Chromium Aluminium Sputtering Targets ho na le mehato e latelang:
1. Ho sila le ho kopanya phofo.
2. Hot isostatic hatella kalafo ho fumana dihlahiswa semi-a qeta.
3. Ho lokisa chromium aluminium alloy sputtering target material ho fumana chromium aluminium alloy sputtering target material.
Nakong ea ts'ebetso ea ho beha lipakane tsa CrAl sputtering, ho etsoa seaparo se thata sa Aluminium-Chrom-Nitrid (AlCrN). Ho roala hona ho bontša boima bo phahameng le thepa ea ho hanyetsa oxidation esita le mocheso o phahameng. Li-cutters li ka sebetsa ka lijo tse phahameng ho eketsa tlhahiso le ho phahamisa boleng ha li sebelisa mechine ea CNC.
Lipheo tsa rona tse tloaelehileng tsa AlCr le thepa ea tsona
Cr-70Alho% | Cr-60Alho% | Cr-50Alho% | |
Bohloeki (%) | 99.8/99.9/99.95 | 99.8/99.9/99.95 | 99.8/99.9/99.95 |
Botenya(g/cm3) | 3.7 | 4.35 | 4.55 |
Gpula Boholo(µm) | 100/50 | 100/50 | 100/50 |
Tshebetso | HIP | HIP | HIP |
Rich Special Materials e sebetsa ka ho khetheha ho Tlhahiso ea Sputtering Target mme e ka hlahisa Lisebelisoa tsa Aluminium Chromium Sputtering ho latela litlhaloso tsa Bareki. Lihlahisoa tsa rona li na le thepa e ntle ea mochini, sebopeho se ts'oanang, bokaholimo bo bentšitsoeng bo se nang karohano, li-pores kapa mapetsong. Ho fumana lintlha tse ling, ka kopo ikopanye le rona.