CoFeV Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Vanadium sputtering target e na le 52% content ea Cobalt, 9% -23% content ea Vanadium le tse ling - ductile permanent-magnetic material. E bonts'a bokhoni bo botle ba polasetiki ea deformation mme e ka etsoa ka likarolo tse nang le mefuta e rarahaneng.

Cobalt Iron Vanadium alloy alloy sputtering target e na le matla a holimo haholo a saturation flux density Bs(2.4T) le mocheso oa Curie(980~1100℃). E ka thusa ho fokotsa boima ba 'mele' me e ka ntlafatsa botsitso maemong a mocheso a phahameng. Ke thepa e loketseng lisebelisoa tsa motlakase tsa sefofane (mechini e menyenyane e khethehileng ea motlakase, makenete ea motlakase le relay ea motlakase). E boetse e na le coefficient e phahameng ea saturation magnetostriction, 'me e ka hlahisa transducer ea magnetostrictive.

Rich Special Equipment e sebetsa ka ho khetheha Tlhahisong ea Sputtering Target mme e ka hlahisa Cobalt Iron Vanadium Sputtering Materials ho latela litlhaloso tsa Bareki. Ho fumana lintlha tse ling, ka kopo ikopanye le rona.