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CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom E entsoe

Cobalt Iron Tantalum Zirconium

Tlhaloso e Khutšoanyane:

Sehlopha

Sepheo sa Alloy Sputtering

Foromo ea Lik'hemik'hale

CoFeTaZr

Sebopeho

Cobalt Iron Tantalum Zirconium

Bohloeki

99.9%, 99.95%, 99.99%

Sebopeho

Lipoleiti, Lipehelo tsa Kholomo, li-arc cathodes, tse entsoeng ka mokhoa o ikhethileng

Mokhoa oa Tlhahiso

Ho qhibiliha ha Vacuum

Boholo bo fumanehang

L≤200mm, W≤200mm


Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Cobalt Iron Tantalum Zirconium sputtering target e etsoa ka mokhoa oa ho qhibilihisa vacuum. Ts'ebetso ena ea tlhahiso e ka sireletsa ka katleho likarolo tse kholo ho tsoa ho oxidation le ho netefatsa microstructure e tšoanang, boholo ba lijo-thollo tse sa tšoaneng le ho lumellana ho phahameng ha lifilimi tse behiloeng.

Ka mor'a phekolo ea mocheso, PTF ea sepheo e ka ntlafatsoa haholo, kahoo e atisa ho sebelisoa bakeng sa lisebelisoa tse bonolo tsa makenete ka mekhahlelo ea ho rekota ea perpendicular magnetic.

Rich Special Materials e sebetsana ka ho khetheha le Tlhahiso ea Sputtering Target mme e ka hlahisa Cobalt Iron Tantalum Zirconium Sputtering Materials ho latela litlhaloso tsa Bareki. Ho fumana lintlha tse ling, ka kopo ikopanye le rona.


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