Iyada oo korodhka baahida suuqa, noocyo badan oo badan oo ah bartilmaameedyada sputtering ayaa si joogto ah loo cusbooneysiiyaa. Qaar waa la yaqaan qaarna lama yaqaan macaamiisha. Hadda, waxaan jeclaan lahayn inaan kula wadaagno waxa ay yihiin noocyada bartilmaameedyada sputtering magnetron.
Bartilmaameedka sputtering wuxuu leeyahay noocyada soo socda: bartilmaameed daahan biraha sputtering, Alloy sputtering bartilmaameedka, bartilmaameedka dhoobada dhoobada, Boride dhoobada dhoobada, bartilmaameedka dhoobada karbiide, bartilmaameed sputtering dhoobada fluoride, bartilmaameedka dhoobada dhoobada nitride, bartilmaameed dhoobada oksaydhka, bartilmaameed dhoobada selenide, selenide dhoobada sputtering. , bartilmaameedka dhoobada dhoobada silicide, Bartilmaameedka sulfide dhoobada, bartilmaameedka dhoobada dhoobada, bartilmaameedyada kale ee dhoobada, Chromium doped silicon oxide target ceramic target (CR SiO), bartilmaameedka fosfide indium (INP), bartilmaameedka arsenide (pbas), bartilmaameedka indium arsenide (InAs).
Tuuritaanka Magnetron guud ahaan waxa loo qaybiyaa laba nooc: sputtering DC iyo RF sputtering. Mabda'a qalabka wax lagu dhufto ee DC waa mid fudud, heerkeeduna sidoo kale waa dhakhso marka birta la daadiyo. RF sputtering si weyn ayaa loo isticmaalaa. Marka laga soo tago faafinta xogta dhaqdhaqaaqa, waxa ay sidoo kale faafin kartaa xogta aan shaqaynayn. Isla mar ahaantaana, bartilmaameedka candhuuftu wuxuu sidoo kale fuliyaa tufaax falcelineed si uu u diyaariyo xogta isku dhafan sida oxides, nitrides iyo karbides. Haddii inta jeer ee RF uu kordho, waxay noqon doontaa mikrowave plasma sputtering. Waqtigan xaadirka ah, resonance electron cyclotron (ECR) mikrowave balasmaha sputtering ayaa caadi ahaan loo isticmaalaa.
Waqtiga boostada: Meey-18-2022