Wholesale NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Nickel Tantalum

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Category	Alloy Sputtering Target
Chemical Formula	NiTa
Composition	Nickel tantalum
Kuchena	99.9%, 99.95%, 99.99%
Shape	Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa
Production Process	Vacuum Melting, PM
Saizi Inowanikwa	L≤200mm, W≤200mm

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Nickel Tantalum Sputtering Targets inogadzirwa nenzira yekunyunguduka kwevacuum kana poda metallurgical process. Iine kuchena kwepamusoro uye homogeneous microstructure.

Nickel Tantalum Sputtering Targets anoshandiswa zvakanyanya mumhepo, ndege, maindasitiri ekufambisa. Kuramba kwayo kwakanaka kune yakanyanya tembiricha yepamusoro reactivity kunobva kune yakakura huwandu hweTantalum iripo mualloy, iyo ine yakanyanya kunyungudika tembiricha ye3000 ° C. Aluminium, Yttrium uye Chronium inowanzowedzerwa kuitira kuvandudza zvivakwa.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Nickel Tantalum Sputtering Materials zvinoenderana neVatengi 'zvakatemwa. Kuti uwane mamwe mashoko, tapota taura nesu.

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