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NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Chromium Aluminium Silicon

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

NiCrAlSi

Composition

Nickel Chromium Aluminium Silicon

Kuchena

99.5%, 99.9%, 99.95%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤1500mm, W≤200mm


Product Detail

Product Tags

Chinangwa cheNiCrAlSi Sputtering chinogadzirwa neVacuum Melting, Casting uye Kupisa Kurapa kuti ive nechokwadi chekuenderana, saizi yakanaka yezviyo uye kuita kwakanaka.

Nekuda kwekunaka kwayo kwepamusoro resistivity, yakanaka anti-corrosion maitiro, yakakwirira tembiricha kuramba uye solderability, Nickel Chromium Aluminium Silicon alloy inoshandiswa zvakanyanya mumaindasitiri akawanda ekushandisa, anosanganisira Metallurgy, Mechanical kugadzira, uye Midziyo Yemumba.

Rich Special Equipment inyanzvi muKugadzira KweSputtering Target uye inogona kugadzira Nickel Chromium Aluminium Silicon Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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