Kugamuchirwa kumawebhusaiti edu!

AlNi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Aluminium Nickel

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

AlNi

Composition

Aluminium Nickel

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting, PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Aluminium Nickel alloy sputtering target inogadzirwa nenzira yekunyungudika kwevacuum uye simba resimbi. Kusanganisa Aluminium neNickel muhuwandu hunodiwa kupa AlNi yekukanda ingot. Iyo ingot yekukanda inochekwa kuti iite inodiwa chimiro chechinangwa. Iyo ine yakakwirira kuenderana, yakanatswa zviyo saizi uye homogeneous microstructure, isina gasi puff kana pores.

Nekuda kwekubatanidzwa kwayo kwakanakisa kweiyo coating uye substrate zvinhu, iyo AlNi coating ine kuita kwakanaka pasi pe700 ℃. Ikozvino iyo AlNi sputtering tarisiro inoshandiswa zvakanyanya mukupfeka isingachinjiki machira, anosanganisira ekucheka maturusi, mold, mota uye maindasitiri ekuvaka.

Rich Special Materials ndiye Mugadziri weSputtering Target uye anogona kugadzira Aluminium Nickel Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.


  • Zvakapfuura:
  • Zvinotevera: