Iye zvino vashandisi vakawanda vanonzwisisa marudzi ezvinangwa uyemashandisirwo ayo, asi kupatsanurwa kwayo kunogona kunge kusiri kujeka. Zvino ngatiiteiRSM injiniya share neweimwe induction ye magnetron sputtering targets.
Sputtering target: metal sputtering coating target, alloy sputtering coating target, ceramic sputtering coating target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenide ceramic sputtering chinangwa, selenide ceramic sputtering. chinangwa, sulfide ceramic sputtering target, telluride ceramic sputtering target, zvimwe zvinangwa zveceramic, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).
Magnetron sputtering inowanzokamurwa kuita marudzi maviri: DC sputtering uye RF sputtering. Iyo musimboti weDC sputtering equipment iri nyore, uye mwero wayo unokasira zvakare pakusvipa simbi. RF sputtering inoshandiswa zvakanyanya. Kuwedzera kune sputtering conductive data, inogona zvakare sputter isiri-conductive data. Iyo sputtering target inogona zvakare kushandiswa kune reactive sputtering kugadzirira komputa data senge oxides, nitrides uye carbides. Kana iyo RF frequency ikawedzera, inova microwave plasma sputtering. Parizvino, electron cyclotron resonance (ECR) microwave plasma sputtering inowanzoshandiswa.
Nguva yekutumira: May-26-2022