Inogona kukamurwa kuita DC magnetron sputtering uye RF magnetron sputtering.
Iyo DC sputtering nzira inoda kuti chinonangwa chikwanise kuendesa iyo yakanaka charge inowanikwa kubva kuion bombardment process kuenda kune cathode iri padhuze nayo, uye ipapo nzira iyi inogona kungosvipa iyo conductor data, iyo isingakodzere data rekudzivirira, nekuti ion charge pamusoro pepamusoro haigone kuderedzwa kana ichibhomba chinangwa chekudzivirira, izvo zvinozotungamira mukuwedzera kweiyo inogoneka pane inotarirwa nzvimbo, uye inenge yese voltage inoshandiswa inoshandiswa kune chinangwa, saka mikana yeion. kukurumidza uye ionization pakati pemapango maviri ichaderedzwa, kana kunyange haigone kuve ionized, Zvinotungamirira mukukundikana kwekuenderera mberi kwekubuda, kunyange kubudiswa kwekuvhiringidza uye kuputika kwekuputika. Naizvozvo, redhiyo frequency sputtering (RF) inofanirwa kushandiswa kuvharisa zvibodzwa kana zvisiri zvesimbi zvinonangwa zvine hutsika husina kunaka.
Iyo sputtering process inosanganisira yakaoma kuparadzira maitiro uye akasiyana ekufambisa simba maitiro: kutanga, zvimedu zvechiitiko zvinobonderana elastically nemaatomu anonangwa, uye chikamu chesimba rekinetic chezvimedu zvechiitiko chinozoendeswa kumaatomu anonangwa. Simba rekinetic remamwe maatomu anonangwa rinodarika chipingamupinyi chinoitwa nemamwe maatomu akaatenderedza (5-10ev yesimbi), uye anobva adonhedzwa kubva pane lattice lattice kuti abudise maatomu asiri panzvimbo, Uyezve kudhumhana kwakadzokororwa nemaatomu ari pedyo. , zvichikonzera kubonderana. Kana iko kudhumhana uku kwasvika pamusoro pechakanangana, kana simba rekinetic ramaatomu riri pedyo nepamusoro pechinhu chiri kutariswa rakakura kudarika simba rinosunga pamusoro (1-6ev yesimbi), maatomu aya anozoparadzana kubva pamusoro pechinhu chiri kutariswa. uye pinda vacuum.
Sputtering coating ihunyanzvi hwekushandisa zvinochaja zvimedu kubhomba pamusoro pechinangwa muvacuum kuita kuti zvimedu zvinobhomba zviunganidze pane substrate. Kazhinji, yakaderera-kumanikidza inert gasi kupenya kuburitswa kunoshandiswa kugadzira chiitiko ions. Iyo cathode inonangwa inogadzirwa nezvinhu zvekupfeka, iyo substrate inoshandiswa seanode, 0.1-10pa argon kana imwe inert gasi inounzwa mukamuri yekutsvaira, uye kubuda kunopenya kunoitika pasi pechiito checathode (chinangwa) 1-3kv DC isina kunaka yakakwira. voltage kana 13.56MHz RF voltage. Ionized argon ions inobhomba pamusoro pechinangwa, zvichiita kuti maatomu anonangwa atsakatike uye aungane pasubstrate kuita firimu rakatetepa. Parizvino, kune nzira dzakawanda dzekupopota, kunyanya dzinosanganisira kusecondary sputtering, tertiary kana quaternary sputtering, magnetron sputtering, target sputtering, RF sputtering, bias sputtering, asymmetric communication RF sputtering, ion beam sputtering uye reactive.
Nekuda kwekuti maatomu anenge apwanyirwa anoputika mushure mekuchinjana simba rekinetic nemaion akanaka nemakumi emagetsi emagetsi emagetsi, maatomu akapwanyika ane simba rakawanda, rinobatsira pakuvandudza kugona kwekuparadzira kwemaatomu panguva yekututirana, kuvandudza kunaka kwekurongedza, nekugadzira. iyo firimu yakagadzirirwa ine kunamatira kwakasimba ne substrate.
Munguva yekuputika, mushure mekunge gasi raitwa ionized, maion egasi anobhururuka achienda kune chinangwa chakabatanidzwa kune cathode pasi pechiito chemunda wemagetsi, uye maerekitironi anobhururuka achienda kumadziro emadziro uye substrate. Nenzira iyi, pasi pemhepo yakaderera uye yakaderera, nhamba yeion iduku uye simba rekuputira rechinangwa rakaderera; Pamusoro pemagetsi uye kumanikidzwa kukuru, kunyange zvazvo maion akawanda anogona kuitika, maerekitironi ari kubhururuka kune substrate ane simba guru, izvo zviri nyore kupisa substrate uye kunyange kuputika kwechipiri, zvichikanganisa kunaka kwefirimu. Pamusoro pezvo, mukana wekudhumhana pakati pemaatomu anotarirwa uye mamorekuru egasi mukubhururuka kuenda kune substrate inowedzerawo zvakanyanya. Nokudaro, iyo ichapararira kune mhango yose, iyo isingazongoparadza chinangwa, asiwo inosvibisa imwe neimwe mutsara panguva yekugadzirira mafirimu akawanda.
Kugadzirisa zvikanganiso zviri pamusoro, DC magnetron sputtering tekinoroji yakagadziridzwa muma1970s. Inonyatsokunda kukanganisa kweyero yakaderera cathode sputtering uye kuwedzera kwekushisa kwe substrate kunokonzerwa nemagetsi. Nokudaro, yakagadziridzwa nokukurumidza uye yakashandiswa zvikuru.
Nheyo yacho ndeiyi: mu magnetron sputtering, nekuti maerekitironi anofamba anoiswa pasi pesimba reLorentz mune remagineti, mafambiro avo ekufamba kunenge kuine tortuous kana kutenderera kutenderera, uye nzira yavo yekufamba inozorebesa. Nokudaro, nhamba yekudhumhana nekushanda gasi mamorekuru inowedzerwa, kuitira kuti plasma density iwedzere, uye ipapo magnetron sputtering rate inovandudzwa zvikuru, uye inogona kushanda pasi pepasi sputtering voltage uye kudzvinyirira kuderedza tsika yekusvibiswa kwefirimu; Kune rumwe rutivi, inovandudzawo simba rezviitiko zveatomu pamusoro pe substrate, saka kunaka kwefirimu kunogona kuvandudzwa kusvika pamwero mukuru. Panguva imwecheteyo, apo maerekitironi anorasikirwa nesimba kuburikidza nemakwikwi akawanda anosvika kune anode, anenge ava maerekitironi asina simba, uye ipapo substrate haigoni kupisa. Saka, magnetron sputtering ine zvakanakira "high speed" uye "low tembiricha". Kuipa kweiyi nzira ndeyekuti iyo insulator firimu haigone kugadzirira, uye iyo isina kuenzana magineti inoshandiswa mumagnetron electrode inokonzeresa pachena kusaenzana kwechinangwa, zvichikonzera kuderera kwekushandisa kwechinangwa, icho chinowanzova 20% - 30 chete. %.
Nguva yekutumira: May-16-2022