Kugamuchirwa kumawebhusaiti edu!

MoNi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Molybdenum Nickel

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

MoNi

Composition

Molybdenum Nickel

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

PM

Saizi Inowanikwa

L≤2000mm,W≤200mm


Product Detail

Product Tags

Molybdenum Nickel Sputtering Target yakagadzirwa neVacuum Melting uye PM, uye ine zvakanakira Molybdenum alloy, Molybdenum neNickel. Iyo ine yakanakisa corrosion kuramba maitiro kunyanya kune hydrochloric acid, uye yakanaka kuramba kune yepakati concentration sulfuric acid mhinduro. Inogona zvakare kushandiswa muAcetic uye phosphoric acid nharaunda. Tinogona kupa Molybdenum Nickel Sputtering Target nekuchena kwepamusoro, saizi yakanaka yezviyo uye kuita kwakanaka.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Molybdenum Nickel Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.


  • Zvakapfuura:
  • Zvinotevera: