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MoNb Sputtering Target High Purity Thin Film PVD Coating Custom Made

Molybdenum Niobium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

MoNb

Composition

Molybdenum Niobium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Zvinangwa zveMolybdenum Niobium zvinogadzirwa nekubatanidza Molybdenum neNiobium poda zvichiteverwa nekukochekera kusvika kuzere. Izvo zvakabatanidzwa zvinhu zvinosarudzwa kunyungudutswa uye zvino zvinogadzirwa kuita inodiwa chimiro chechinangwa.
Molybdenum Niobium sputtering target ine yakakwira kunyungudika, simba, uye kuoma pane tembiricha yakakwira. Iyo inoratidzawo yakanakisa kupisa uye magetsi conductivity ine yakaderera coefficient yekuwedzera kwekupisa. Kuwedzera Niobium muMolybdenum inovandudza mvura-crystal kuratidza pixel kanenge katatu.

Molybdenum Niobium sputtering target zvinhu zvakakosha zveFlat Panel Display (FPD) uye inoshandiswa muhuwandu hwakawanda mumolybdenum-niobium alloys yeLiquid Crystal Display (LCD) source cuboid liquid crystal display, field emission display, organic light-emitting display, plasma. ratidza mapaneru, cathodoluminescence kuratidza, vacuum fluorescent kuratidza, TFT inochinjika kuratidza uye touch screens, etc. Electron beam evaporation ye panel display process inogona kuita Niobium deposit kumucheto wepamusoro emitter, iyo ichave inobatsira zvikuru mukugadzira zvikwangwani zvakakura zvine tsanangudzo yakakwirira.

Rich Special Equipment inoshanda muKugadzira Sputtering Target uye inogona kugadzira Molybdenum Niobium Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.


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