MoCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Molybdenum Copper
Molybdenum Copper sputtering target inogadzirwa nenzira ye infiltration sintering: Molybdenum powders sintered uye inoumbwa kuita semi-finished products, yakasanganiswa neinozotevera microwave-assisted aqueous solution strategy. Molybdenum Copper alloy ine zvakatanhamara zvemuviri uye zvemagetsi zvimiro: inogutsa magetsi uye yekupisa conductivity, yakaderera uye inogadziriswa coefficient yekuwedzera kwekupisa, kupfeka kuramba, uye yakakwirira tembiricha simba.
| Zvinyorwa (%) | Cu | Mo | Kusachena (%) |
| MoCu10 | 10±2 | Balance | ≤0.1 |
| MoCu15 | 15±3 | Balance | ≤0.1 |
| MoCu20 | 20±3 | Balance | ≤0.1 |
| MoCu25 | 25±3 | Balance | ≤0.1 |
| MoCu40 | 40±5 | Balance | ≤0.1 |
Rich Special Equipment inyanzvi muKugadzira Sputtering Target uye inogona kugadzira Molybdenum Copper Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.
Zvigadzirwa zvikamu
-
NbTi Sputtering Target High Purity Thin Firimu Pv...
-
TiAl Sputtering Target High Purity Thin Firimu Pv...
-
WNi Sputtering Target High Purity Thin Film Pvd...
-
WTi Sputtering Target High Purity Thin Film Pvd...
-
AlMg Alloy Sputtering Target High Purity Thin F...
-
CrAlMo Alloy Sputtering Target High Purity Thin...