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FeSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Silicon

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

FeSi

Composition

Iron Silicon

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Iron Silicon alloy kazhinji ine Silicon yemukati ye0.5-4%. Iyo ine yakaderera hysteresis kurasikirwa pane yakachena Iron uye yakakwirira resistivity, uye inogona kuiswa mune magineti. Kuti uderedze kurasikirwa kwazvino, Iron Silicon alloy inowanzopisa yakakungurutswa mu 0.35-0.5mm mapepa (silicon lamination). Silicon lamination inoshandiswa zvakanyanya muindasitiri yemagetsi, saka inonziwo simbi yemagetsi.

Ferrosilicon alloy inopa yakanakisa magineti pfuma uye yakaderera saturation magnetization. Iyo ine coarse zviyo saizi, yakakwirira magineti permeability uye resistivity, yakaderera yekumanikidza simba uye musimboti kurasikirwa. Silicon inogona kukurudzira graphitization yeCarbon musimbi uye nekudzivirira nemagineti kuchembera chiitiko. Ferrosilicon alloy ine kugadzikana kwakanyanya uye inogona kuiswa yakanyanyisa nharaunda.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Iron Silicon Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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