Kugamuchirwa kumawebhusaiti edu!

FeMn Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Manganese

Tsanangudzo Pfupi:

Category

Alloy Sputtering Target

Chemical Formula

FeMn

Composition

Iron Manganese

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤2000mm,W≤200mm


Product Detail

Product Tags

Iron Manganese alloy sputtering target inogadzirwa nenzira yekunyungudika vacuum.
Manganese isimbi yakakosha. Mutengi mukuru wemanganese iindasitiri yesimbi nesimbi. Inopfuura 95% yemanganese yakagadzirwa inoshandiswa nenzira yeferromanganese uye silicomanganese alloys mukugadzirwa kwesimbi nesimbi. Inogona kunatsa saizi yezviyo uye kuvandudza kuomarara kwekupinda. Manganese inogona zvakare kuve iyo alloy yekuwedzera yekuvandudza kushora kuramba uye forgeability.

Iron Manganese alloy inogona kushandiswa se deoxidizer uye alloy additive. Industries iyo alloy yakajairika inosanganisira aerospace, biomedical, mafuta uye gasi, mauto, zvemagetsi, simba idzva, dunhu rakasanganiswa, kuchengetedza data uye mota.

Rich Special Equipment inoshanda muKugadzira Sputtering Target uye inogona kugadzira Iron Manganese Sputtering Materials zvinoenderana neVatengi 'zvakatemwa. Kuti uwane mamwe mashoko, tapota taura nesu.


  • Zvakapfuura:
  • Zvinotevera: