Wholesale FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Iron Cobalt Tantalum

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Category	Alloy Sputtering Target
Chemical Formula	FeCoTa
Composition	Iron Cobalt Tantalum
Kuchena	99.9%, 99.95%, 99.99%
Shape	Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa
Production Process	Vacuum Melting, PM
Saizi Inowanikwa	L≤200mm,W≤200mm

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Iron Cobalt Tantalum zvinonangwa zvinowanzo kuwanikwa mune denderedzwa chimiro uye yakakosha yakaonda firimu zvinhu zveyakamira magineti yekurekodha midhiya. Huwandu hwakawanda hweTantalum huripo mune alloy hwaizoguma nekusarurana uye kuunza zvidimbu zvisina kunyungudika. Isu tinoshandisa yakasarudzika nzira yekugadzira iyo inogona kuve nechokwadi chehomogeneity yeiyo microstructure uye kuvandudza ma mechanic zvivakwa zvezvinhu.

Product name		FeCoTa
Fe/wt%		Balance	Balance	Balance
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Metal tsvina yemukati(ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Gasi tsvina yemukati(ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Rich Special Materials anoshanda muKugadzira kweSputtering Target uye anogona kugadzira Iron Cobalt Tantalum Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.

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