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FeAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Aluminium Alloy Target

Tsanangudzo Pfupi:

Category

Alloy Sputtering Target

Chemical Formula

FeAl

Composition

Iron Aluminium alloy chinangwa

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤2000mm,W≤200mm


Product Detail

Product Tags

Kazhinji, Iron Aluminium alloy sputtering target ine 6% -16% zviri mukati meAluminium. Inoratidza yakanakisa magineti zvimiro uye inowanzoshandiswa mufirimu deposition ye micromotors.
Iron Aluminium alloys anowanzo kuwanikwa mumitsetse ine ukobvu hwe 0.1-0.5mm. Iwo anoratidza yakakwirira resistivity, kuoma, vibration uye kukanganisa kuramba, akasanganiswa neakaderera density (6.5 ~ 7.2g/m3). Iron cores yakagadzirwa kubva kuIron Aluminium mapepa ane yakaderera eddy ikozvino kurasikirwa uye huremu huremu.

Iron Aluminium Alloys akakamurwa kuita: 1J6. 1J12. 1J16, nhamba iri kumashure kweJ ndiyo yeAluminium. Nekuwedzera kweAluminium yemukati, iyo magineti conductivity uye resistivity yezvinhu zvaizovandudzwa, nepo saturation yemagineti induction - yakaderera.
Rich Special Equipment inyanzvi muKugadzira KweSputtering Target uye inogona kugadzira Iron Aluminium Sputtering Materials zvinoenderana neVatengi 'zvakatemwa. Kuti uwane mamwe mashoko, tapota taura nesu.


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