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CuTi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Titanium

Tsanangudzo Pfupi:

Category

Alloy Sputtering Target

Chemical Formula

CuTi

Composition

Copper Titanium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Titanium sputtering target inogadzirwa nenzira yekunyunguditsa vacuum. Iyo ine Copper yemukati ye80% ~90%, uye chiyero cheTitanium. Inoratidza simba rakanyanya kukwirira (1000N/mm ^ 2), yakanakisa kushushikana kushushikana maitiro uye yakakwirira-tembiricha kukodzera. Copper Titanium alloy chinhu chakavimbika chekuchengetedza zvakatipoteredza. Inogona kuvandudza kuoma, simba, magetsi conductivity uye elongation muzana.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Copper Titanium Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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