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CuCr Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Mhangura Chromium

Tsanangudzo Pfupi:

Category

Alloy Sputtering Target

Chemical Formula

CuCr

Composition

Mhangura Chromium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting, PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Chromium alloy sputtering target is Cu-based material ine Chromium element yakawedzerwa mairi. Iyo ine yakakwirira mechanical simba uye kuoma, yakanakisa magetsi uye kupisa conductivity. Cu-Cr alloy yakawana zvakasiyana-siyana zvekushandisa zvinoshandisa midziyo pasi pekupisa kwepamusoro nekuda kwemaitiro ayo chaiwo: kukodzera kwepamusoro-kupisa, oxidation resistance, corrosion resistance uye machinability.

Copper Chromium zvinhu zvine hurema hwakanyanya, kupfeka kuramba, bend kuramba, kutsemuka kuramba uye tembiricha yekuchinja. imhando yesimba rinowanikwazve. Iyo trivalent chromium iripo haikonzere njodzi kuhutano hwevanhu. Iri zvakare chinhu chakajairika chekuitisa. Copper Chromium yakashandiswa zvakanyanya muOptoelectronic Technology zvigadzirwa, senge touch panel, LCD uye solar masero.

Rich Special Materials Mugadziri weSputtering Target anogona kuburitsa Copper Chromium Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.


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