CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Kugadzirwa kweChronium Silicon Sputtering Targets kunosanganisira matanho anotevera:
1.Vacuum kunyunguduka kweSilicon uye Chronium kuti uwane nhanho alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic kudzvanya kurapa kuti uwane semi-yakapedza zvigadzirwa.
4.Kugadzira rough chromium-silicon alloy sputtering target material kuwana chromium-silicon alloy sputtering target material.

CrSi inowanzo shandiswa seyakanyanya kupikisa firimu zvinhu, inoratidzira yakakwirira kuramba, kugadzikana uye yakaderera tembiricha coefficient yekupikisa. Chronium neSilicon zvinogona kuburitsa akawanda silicide nhanho seCr3Si, Cr5Si3,, CrSi, CrSi2. Maitiro ekugadzira, kuumbwa uye Kupisa kurapwa maitiro eiyo CrSi firimu anokanganisa zvakanyanya kuita kwayo.

Rich Special Materials anoshanda muKugadzira kweSputtering Target uye anogona kugadzira Chronium Silicon Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.