Wholesale CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Chromium Aluminium

CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Tsanangudzo Pfupi

Category	Alloy Sputtering Target
Chemical Formula	CrAl
Composition	Chromium Aluminium
Kuchena	99.7%, 99.9%, 99.95%, 99.99%
Shape	Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa
Production Process	Vacuum Melting, PM
Saizi Inowanikwa	L≤2000mm,W≤200mm

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Kugadzirwa kweChromium Aluminium Sputtering Targets kunosanganisira matanho anotevera:

1. Kukuya uye kusanganisa.

2. Kupisa isostatic kudzvanya kurapwa kuti uwane semi-apedza zvigadzirwa.

3. Kugadzira rough chromium aluminum alloy sputtering target material kuwana chromium aluminum alloy sputtering target material.

Munguva yekuisa maitiro eCrAl sputtering zvinangwa, yakaoma Aluminium-Chrom-Nitrid (AlCrN) coating inogadzirwa. Uku kupfekedza kunoratidza kuomarara kwakanyanya uye oxidation kuramba zvivakwa kunyangwe pakupisa kwakanyanya. Iwo anocheka anogona kumhanya nepamusoro pekudya kuti awedzere goho uye kusimudza mhando kana uchishandisa CNC michina.

Yedu yakajairika AlCr tarisiro uye zvivakwa zvavo

	Cr-70Alpa%	Cr-60Alpa%	Cr-50Alpa%
Kuchena (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density(g/cm³）	3.7	4.35	4.55
Gmvura Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Chromium Sputtering Materials zvinoenderana neVatengi'madidziro. Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana makatsemuka. Kuti uwane mamwe mashoko, tapota taura nesu.

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