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CoNbZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Niobium Zirconium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CoNbZr

Composition

Cobalt Niobium Zirconium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Zvinangwa zveSputter zvakagadzirwa neferromagnetic zvinhu zvakakosha kune yakaonda firimu kuiswa mumaindasitiri akadai sekuchengetera data uye VLSI (yakakura-chikuru kusangana)/semiconductors. Cobalt Niobium Zirconium inogadzirwa nekunyungudutsa maalloys munzvimbo ine vacuum uye kunotevera kukanda kuumba inodiwa chimiro chechinangwa. CoNbZr alloy sputtering target inowanzoshandiswa senzvimbo yekuisa ferromagnetic layer mukugadzirwa kwemagineti yekuchengetedza midhiya uye shanduko yekuchinja mukugadzira bhatiri.

Rich Special Materials anoshanda muKugadzira kweSputtering Target uye anogona kugadzira Cobalt Niobium Zirconium Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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