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CoMn Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Manganese

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CoMn

Composition

Cobalt Manganese

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting, PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Cobalt Manganese sputtering tarisiro inoshandiswa zvakanyanya seyedziviriro yekuputira zvinhu zvesimbi, nekuda kwekupfeka kwayo kwakasarudzika uye kusagadzikana nekuora maitiro. Manganese inoshandiswa sechinhu chinosanganisa kune akawanda akasiyana maapplication. Manganese chinhu chakakosha chesimbi. Kutaura zvazviri, chinhu ichi chemakemikari chiripo mune zvose zvinotengeswa zvesimbi uye chinokonzera kuoma kwesimbi uye kusimba, asi zvishoma pane kabhoni. Kana manganese yawedzerwa kune alloy, inogona kuvandudza zvakanyanya magineti.

Rich Special Equipment inyanzvi muKugadzira Sputtering Target uye inogona kugadzira Cobalt Manganese Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.


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