CoFeV Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Vanadium sputtering target ine 52% yemukati meCobalt, 9% -23% zvirimo muVanadium uye yasara - ductile zvachose-magineti zvinhu. Iyo inoratidza yakanakisa deformation yepurasitiki kugona uye inogona kugadzirwa kuita zvikamu zvine mafomu akaomarara.

Cobalt Iron Vanadium alloy sputtering target ine yakanyanya kukwira saturation flux density Bs(2.4T) uye Curie tembiricha(980~1100℃). Inogona kubatsira nekuderedza uremu uye inogona kuvandudza kugadzikana pamatembiricha akakwira. Icho chinhu chakakodzera chemidziyo yemagetsi endege (makina madiki akakosha emagetsi, magineti emagetsi uye relay yemagetsi). Iyo zvakare ine yakakwira saturation magnetostriction coefficient, uye inogona kugadzira magnetostrictive transducer.

Rich Special Materials anoshanda muKugadzira kweSputtering Target uye anogona kugadzira Cobalt Iron Vanadium Sputtering Materials zvinoenderana neVatengi'madidziro. Kuti uwane mamwe mashoko, tapota taura nesu.