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CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Tantalum Zirconium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CoFeTaZr

Composition

Cobalt Iron Tantalum Zirconium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Cobalt Iron Tantalum Zirconium sputtering target inogadzirwa nenzira yekunyungudika vacuum. Iyi nzira yekugadzira inogona kunyatso chengetedza zvikamu zvikuru kubva kune oxidation uye ive nechokwadi chehomogenous microstructure, saizi yezviyo yunifomu uye kuenderana kwakanyanya kwemafirimu akaiswa.

Mushure mekupisa kupisa, iyo PTF yechinangwa inogona kuvandudzwa zvakanyanya, saka inowanzoshandiswa kune yakapfava magineti layer zvinhu mune perpendicular magineti yekurekodha layer.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Cobalt Iron Tantalum Zirconium Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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