CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Cobalt Iron Tantalum Zirconium
Cobalt Iron Tantalum Zirconium sputtering target inogadzirwa nenzira yekunyungudika vacuum. Iyi nzira yekugadzira inogona kunyatso chengetedza zvikamu zvikuru kubva kune oxidation uye ive nechokwadi chehomogenous microstructure, saizi yezviyo yunifomu uye kuenderana kwakanyanya kwemafirimu akaiswa.
Mushure mekupisa kupisa, iyo PTF yechinangwa inogona kuvandudzwa zvakanyanya, saka inowanzoshandiswa kune yakapfava magineti layer zvinhu mune perpendicular magineti yekurekodha layer.
Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Cobalt Iron Tantalum Zirconium Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.