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CoCrTa Alloy Sputtering Target High Purity Thin Firimu Pvd Coating Tsika Yakagadzirwa

Cobalt Chromium Tantalum

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CoCrTa

Composition

Cobalt Chromium Tantalum

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Cobalt Chromium Tantalum sputtering chinangwa chinogadzirwa nekukanda maitiro uye vacuum kunyungudika. uye zvobva zvaumbwa kuita chinodiwa chimiro chechinangwa. Iine kuchena kwepamusoro uye homogenous microstructure. Co-Cr-Ta yaimbove yakakosha zvinhu zvekurekodha magineti kune yayo magineti zvivakwa: yakakwirira kumanikidza, yakaderera ruzha chivakwa uye yakanakisa squareness.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Cobalt Chromium Tantalum Sputtering Materials zvinoenderana neVatengi 'mataurirwo. Kuti uwane mamwe mashoko, tapota taura nesu.


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